X-ray photoelectron spectroscopic characterization of ultra-thin silicon oxide films on a Mo(100) surface
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference29 articles.
1. Oxidation of silicon
2. Photoemission study of the SiO2/Si interface structure of thin oxide film on vicinal Si(100) surface
3. In-depth profiling of the SiO2/Si-interface electronic structure using low-energy electron energy loss spectroscopy
4. XPS and AES investigations of silicon oxidation by ion-implanted oxygen
5. Bonding structure of silicon oxide films
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