Interface formation of W evaporated on Si(111) (7 × 7)
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference21 articles.
1. Metal‐oxide‐semiconductor field‐effect transistors fabricated using self‐aligned silicide technology
2. Formation of WSi2at the Si-W(110) interface
3. Quantitative chemical analysis by ESCA
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