The atomic-scale removal mechanism during chemo-mechanical polishing of Si(100) and Si(111)
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference28 articles.
1. Chemistry of silicon surfaces after wet chemical preparation: A thermodesorption spectroscopy study
2. Hydrogen on Si: Ubiquitous surface termination after wet-chemical processing
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