NiSi2 on Si(111) I. Effects of substrate cleaning procedure and reconstruction
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference42 articles.
1. Epitaxial silicides
2. Epitaxial growth of the nickel disilicide phase
3. Structure and Nucleation Mechanism of Nickel Silicide on Si(111) Derived from Surface Extended-X-Ray-Absorption Fine Structure
4. High resolution studies of NiSi2 ultrathin film formation by ion scattering and cross-section tem
5. Ni‐Si(111) interface: Growth of Ni2Si islands at room temperature
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1. Surface Cleanness Dependence of the Interfacial Orientation of Endotaxial NiSi[sub 2] on Si(001);Electrochemical and Solid-State Letters;2009
2. Surfactant effect of hydrogen for nickel growth on Si(111)7 × 7 surface;Surface Science;1996-06
3. High resolution electron microscopy study of nickel silicide ? silicon interface grown by molecular beam epitaxy;Journal of Materials Science Letters;1996
4. Growth and characterization of epitaxial Ni and Co silicides;Materials Science Reports;1992-05
5. Surface and bulk diffusion of adsorbed nickel on ultrathin thermally grown silicon dioxide;Surface Science;1992-04
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