A photoemission study of ammonia adsorption on Si(100)2 × 1 and Si(111)2 × 1 surfaces-Reference-Cited by-同舟云学术

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A photoemission study of ammonia adsorption on Si(100)2 × 1 and Si(111)2 × 1 surfaces

Published:1993-08 Issue:1-2 Volume:293 Page:35-40
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Bischoff J.L.,Kubler L.,Bolmont D.,Sébenne C.A.,Lacharme J.-P.,Bonnet J.E.,Hricovini K.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference28 articles.

1. Reaction of Si(100) with NH3: Rate-Limiting Steps and Reactivity Enhancement via Electronic Excitation

2. The reaction of Si(100) 2×1 with NO and NH3: The role of surface dangling bonds

3. Photoemission study of ammonia dissociation on Si(100) below 700 K

4. Nitrogen bonding changes versus substrate temperature evidenced by X.P.S. in SiNxHy alloys prepared with NH3

5. ESDIAD of first-row protic hydrides adsorbed on silicon(100): structure and reactivity

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1. Angle-resolved X-ray photoelectron spectroscopy intensity modeling of SiNx ultrathin layer grown on Si (100) and Si (111) substrates by N2 plasma treatment;Thin Solid Films;2024-06

2. Interaction–Deletion: A Composite Energy Method for the Optimization of Molecular Systems Selectively Removing Specific Nonbonded Interactions;The Journal of Physical Chemistry A;2021-05-20

3. Cooperative nitrogen insertion processes: Thermal transformation ofNH3on a Si(100) surface;Physical Review B;2007-08-30

4. Multiple adsorption configurations ofNH3molecules on the Si(001) surface;Physical Review B;2006-01-05

5. Laser reactivity of NH3 on silicon: a laser multiphoton-ionisation mass spectrometry study;Applied Surface Science;2002-01

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