Laser reactivity of NH3 on silicon: a laser multiphoton-ionisation mass spectrometry study-Reference-Cited by-同舟云学术

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Laser reactivity of NH3 on silicon: a laser multiphoton-ionisation mass spectrometry study

Published:2002-01 Issue:1-4 Volume:186 Page:111-116
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Gonthiez T.,Le Menn E.,Gibert T.,Brault P.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference8 articles.

1. Dissociative NH3 adsorption on the Si(100)2 × 1 surface at 300 K

2. A photoemission study of ammonia adsorption on Si(100)2 × 1 and Si(111)2 × 1 surfaces

3. Electron-energy-loss spectra of the Si(100)-(2×1) surface exposed toNH3

4. Ph. Avouris, F. Bozso, R.J. Hamers, J. Vac. Sci. Technol. B 5 (5) (1987).

5. A LEED, AES and TDS study of very thin nitride film growth on Si(100) by direct thermal nitridation in NH3

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Current Awareness;Journal of Mass Spectrometry;2002

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