Optical, vibrational and compositional study of amorphous silicon oxynitride thin films grown by an RF plasma using N2O + SiH4 gas mixtures-Reference-Cited by-同舟云学术

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Optical, vibrational and compositional study of amorphous silicon oxynitride thin films grown by an RF plasma using N2O + SiH4 gas mixtures

Published:1993-06 Issue: Volume:70-71 Page:695-700
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Campmany J.,Andújar J.L.,Canillas A.,Costa J.,Bertran E.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference15 articles.

1. Improved reliability characteristics of submicrometer nMOSFETs with oxynitride gate dielectric prepared by rapid thermal oxidation in N/sub 2/O

2. Oxide‐nitride storage dielectrics on smooth and rough polycrystalline silicon layers

3. Study of PECVD Silicon Oxynitride Thin Layers as ISFET Sensitive Insulator Surface for pH Detection

4. Real time controlled rf reactor for deposition of a-Si:H thin films

5. In situ optical characterizations for rf plasma deposited a-Si: H thin films

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1. In-depth study of silicon-oxide thin films: Effect of N2O/SiH4 gas mixture;AIP Conference Proceedings;2024

2. Surface Modifications and Surface Characterization of Biomaterials Used in Bone Healing;Materials for Bone Disorders;2017

3. Detailed investigation of the structural and passivation properties of silicon oxynitrides for silicon solar cells;physica status solidi (c);2012-08-27

4. Formation of Primary Amines on Silicon Nitride Surfaces: a Direct, Plasma-Based Pathway to Functionalization;Langmuir;2007-02-27

5. Optimization of plasma-enhanced chemical vapor deposition silicon oxynitride layers for integrated optics applications;Thin Solid Films;2007-02

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