Criteria for the extraction of SIMOX material parameters from spectroscopic ellipsometry data-Reference-Cited by-同舟云学术

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Criteria for the extraction of SIMOX material parameters from spectroscopic ellipsometry data

Published:1993-01 Issue:1-4 Volume:63 Page:40-44
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Lynch S.,Crean G.M.,Greef R.,Stoemonos J.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference14 articles.

1. Proc. IEDM;Colinge,1989

2. Proc. 4th Int. Conf. on SOI Technology and Devices;Cullen,1990

3. Spectroscopic ellipsometry and transmission electron microscopy study of annealed high‐dose oxygen implanted silicon

4. A study of Si implanted with oxygen using spectroscopic ellipsometry

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thin-film metrology of silicon-on-insulator materials;Applied Physics Letters;2000-01-03

2. Film Thickness Measurements Using Optical Techniques;Surface Engineering;1994

3. Non-destructive depth profiling of silicon ion implantation induced damage in silicon (100) substrates;Thin Solid Films;1993-10

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