Control of the etching reaction of digital etching using tunable UV laser irradation-Reference-Cited by-同舟云学术

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Control of the etching reaction of digital etching using tunable UV laser irradation

Published:1994-12 Issue: Volume:82-83 Page:193-199
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Meguro T.,Ishii M.,Sugano T.,Gamo K.,Aoyagi Y.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference23 articles.

1. Atomic Layer Epitaxy

2. Digital etching of GaAs: New approach of dry etching to atomic ordered processing

3. Layer-By-Layer Controlled Digital Etching by Means of an Electron-Beam-Excited Plasma System

4. Study of Surface Processes in the Digital Etching of GaAs

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3. Ab initio simulations of ultrashort laser pulse interaction with Cl–Si(100): implications for atomic layer etching;Physical Chemistry Chemical Physics;2023

4. Atomic Layer Processes for Material Growth and Etching—A Review;IEEE Transactions on Semiconductor Manufacturing;2021-11

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