Ultraviolet photoelectron spectroscopic study of the surface etching of air-oxidized hydrogenated amorphous silicon by aqueous hydrofluoric acid solution-Reference-Cited by-同舟云学术

Ultraviolet photoelectron spectroscopic study of the surface etching of air-oxidized hydrogenated amorphous silicon by aqueous hydrofluoric acid solution

Published:1992-01 Issue:3-4 Volume:59 Page:239-243
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Bekkay T.,Sacher E.,Yelon A.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference35 articles.

1. Surface contributions to the two-layer structure in the plasma deposition of a-Si : H

2. Predictions of SiHn stretching vibrations on atmospheric contamination of hydrogenated amorphous silicon

3. Evolution of the vibrational spectra of hydrogenated-amorphous-silicon thin films having columnar morphology

4. The surface characterization of the atmospheric contamination of hydrogenated amorphous silicon

5. Kinetics of the room-temperature air oxidation of hydrogenated amorphous silicon and crystalline silicon

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