Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
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1. Infrared spectroscopic study of dimethylaluminum-hydride adsorption on oxidized, hydrogen-terminated, and reconstructed Si surfaces;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2002-03
2. Adsorption and photon-stimulated desorption of CCl4 on an Al(111) surface investigated with synchrotron radiation;The Journal of Chemical Physics;1998-11-08
3. Application of synchrotron radiation to ablation of frozen acetone targets;Applied Surface Science;1998-05
4. Time-Dependent X-Ray Photoelectron Spectroscopy Observed for Dimethylaluminum Hydride Adsorbed on S i O 2;Japanese Journal of Applied Physics;1997-08-01
5. In situ IR spectral study of the reaction of a-Si:H:F films with dimethylaluminum hydride;Vibrational Spectroscopy;1996-12
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