Time-Dependent X-Ray Photoelectron Spectroscopy Observed for Dimethylaluminum Hydride Adsorbed on S i O 2

Abstract

Time-dependent X-ray photoelectron spectroscopy (XPS) was observed for adsorbates of dimethylaluminum hydride formed on SiO2 surfaces. The peak intensity of the C 1s spectra decreased slowly under 1847-eV Al Kα X-ray irradiation, while the binding energy of the Al 2p spectra increased. The time dependence of the XPS spectra varied for the adsorbates formed over a range of temperatures from room temperature up to 200° C. The time dependent XPS spectra was explained by the decomposition of the adsorbates. However decomposition was not complete enough to produce Al or Al2O3. Indirect decomposition by secondary electrons was suggested from X-ray induced electron emission measurements.