The light stability of microcrystalline silicon thin films deposited by VHF

The light stability of microcrystalline silicon thin films deposited by VHF–PECVD method

Published:2010-08 Issue:8 Volume:84 Page:1337-1341
ISSN:0038-092X
Container-title:Solar Energy
language:en
Short-container-title:Solar Energy

Author:

Chen Yongsheng,Gu Jinhua,Xu Yanhua,Lu Jingxiao,Yang Shi-e,Gao Xiaoyong

Funder

State Key Development Program for Basic Research of China

Natural Science Research Program

Publisher

Elsevier BV

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment

Reference14 articles.

1. The influence of deposition temperature to the structure properties of microcrystalline silicon film;Chen;Acta Phys. Sin.,2007

2. The high deposition of microcrystalline silicon thin film by VHF PECVD and the fabrication of solar cells;Chen;Chin. Phys. B,2008

3. Microcrystalline silicon grown by VHF PECVD and the fabrication of solar cells;Chen;Sol. Energy,2008

4. Surface roughening in shadowing growth and etching in 2+1 dimensions;Drotar;Phys. Rev. B,2000

5. A spectroscopic ellipsometry study of the abnormal scaling behavior of high-rate-deposited microcrystalline silicon films by VHF–PECVD technique;Gu;Acta Phys. Sin.,2009

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1. High performance and high stability mechanisms of microcrystalline silicon-based thin-film solar cells deposited by laser-assisted plasma-enhancement chemical vapor deposition system;Solar Energy;2014-09

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3. Modeling and experiments of microcrystalline silicon film deposited via VHF-PECVD;Solar Energy;2013-08

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5. The microstructure and optical properties of crystallized hydrogenated silicon films prepared by very high frequency glow discharge;Applied Surface Science;2011-08