Modeling and experiments of microcrystalline silicon film deposited via VHF-PECVD-Reference-Cited by-同舟云学术

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Modeling and experiments of microcrystalline silicon film deposited via VHF-PECVD

Published:2013-08 Issue: Volume:94 Page:155-161
ISSN:0038-092X
Container-title:Solar Energy
language:en
Short-container-title:Solar Energy

Author:

Chen Yongsheng,Chen Xiping,Jiao Yuechao,Hao Xiuli,Lu Jingxiao,Yang Shi-e

Funder

National Key Basic Research Program of China

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment

Reference18 articles.

1. Frequency variation under constant power conditions in hydrogen radio frequency discharges;Amanatides;Journal of Applied Physics,2001

2. Modelling of silicon hydride clustering in a low-pressure silane plasma;Bhandarkar;Journal of Physics D: Applied Physics,2000

3. Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model;Bleecker;IEEE Transactions on Plasma Science,2004

4. Microcrystalline silicon grown by VHF PECVD and the fabrication of solar cells;Chen;Solar Energy,2008

5. The light stability of microcrystalline silicon thin films deposited by VHF-PECVD method;Chen;Solar Energy,2010

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