The high deposition of microcrystalline silicon thin film by very high frequency plasma enhanced chemical vapour deposition and the fabrication of solar cells-Reference-Cited by-同舟云学术

The high deposition of microcrystalline silicon thin film by very high frequency plasma enhanced chemical vapour deposition and the fabrication of solar cells

Published:2008-09 Issue:9 Volume:17 Page:3464-3470
ISSN:1674-1056
Container-title:Chinese Physics B
language:
Short-container-title:Chinese Phys. B

Author:

Yong-Sheng Chen,Jian-Hua Wang,Jing-Xiao Lu,Wen Zheng,Jin-Hua Gu,Shi-E Yang,Xiao-Yong Gao,Xue-Jun Guo,Shang-Li Zhao,Zhe Gao

Publisher

IOP Publishing

Subject

General Physics and Astronomy

Reference29 articles.

1. Low-temperature fabrication of microcrystalline silicon and its application to solar cells

2. Intrinsic microcrystalline silicon: A new material for photovoltaics

3. Material and solar cell research in microcrystalline silicon

4. Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma

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1. Influence of Hydrogen Dilution on Microstructure of μc-Si: H Films;Key Engineering Materials;2013-01

2. Real time and ex situ spectroscopic ellipsometry analysis microcrystalline silicon thin films growth;Acta Physica Sinica;2012

3. Influence of Deposition Temperature on Microcrystalline Silicon Thin Film Prepared by Plasma Enhanced Chemical Vapor Deposition;Solid State Phenomena;2011-11

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