Effect of substrate temperature on microstructure and optical properties of hydrogenated nanocrystalline Si thin films grown by plasma enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

Effect of substrate temperature on microstructure and optical properties of hydrogenated nanocrystalline Si thin films grown by plasma enhanced chemical vapor deposition

Published:2014-10 Issue: Volume:108 Page:126-134
ISSN:0038-092X
Container-title:Solar Energy
language:en
Short-container-title:Solar Energy

Author:

Amor Sana Ben,Atyaoui Malek,Bousbih Rabaa,Haddadi Ikbel,Dimassi Wissem,Ezzaouia Hatem

Publisher

Elsevier BV

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment

Reference28 articles.

1. Correlation between microstructure and properties of hydrogenated Si thin films grown by plasma enhanced chemical vapor deposition under different hydrogen flow rates

2. Improvement of photoluminescence and electrical properties of porous silicon layer treated with lanthanum

3. Silicon lifetime enhancement by SiNx:H anti-reflective coating deposed by PECVD using SiH4 and N2 reactive gas

4. Temperature-dependent optical properties of B-doped nc-Si:H thin films in the interband region

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