Preparation and Crystallization Characteristics of Hydrogenated Nanocrystalline Silicon Thin Films by Plasma-Enhanced Chemical Vapor Deposition
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Published:2019-05
Issue:3
Volume:55
Page:259-267
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ISSN:1068-3755
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Container-title:Surface Engineering and Applied Electrochemistry
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language:en
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Short-container-title:Surf. Engin. Appl.Electrochem.
Author:
Yuqing Huang ,Liu Jian,Wang Jia,Bao Daxin,Huang Shihua
Subject
Industrial and Manufacturing Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces
Reference14 articles.
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