Investigation of the hydrogen and impurity contents of amorphous silicon by secondary ion mass spectrometry
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference14 articles.
1. Secondary ion quadrupole mass spectrometer for depth profiling—design and performance evaluation
2. Depth Profiling of n‐Type Dopants in Si and GaAs Using Cs+ Bombardment Negative Secondary Ion Mass Spectrometry in Ultrahigh Vacuum
3. Evaluation of a cesium positive ion source for secondary ion mass spectrometry
4. Hydrogen ion implantation profiles as determined by SIMS
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1. Crystallite distribution analysis based on hydrogen content in thin-film nanocrystalline silicon solar cells by atom probe tomography;Applied Physics Express;2020-12-16
2. Application of Elastic Recoil Detection in Materials Analysis;Application of Particle and Laser Beams in Materials Technology;1995
3. Effect of carbon impurities on the density of states and the stability of hydrogenated amorphous silicon;Physical Review B;1994-12-15
4. Elastic recoil detection;Reports on Progress in Physics;1993-07-01
5. Impurity Content and Defect Density in 42 a-Si:H Films;MRS Proceedings;1993-01-01
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