Structural and optical studies on hot wire chemical vapour deposited hydrogenated silicon films at low substrate temperature
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference22 articles.
1. Microcrystalline silicon. Growth and device application;Matsuda;J. Non-Cryst. Solids,2004
2. Production of high-quality amorphous silicon films by evaporative surface decomposition;Doyle;J. Appl. Phys.,1988
3. The role of hydrogen dilution of silane and phosphorous doping on hydrogenated microcrystalline silicon (mc-Si:H) films prepared by hot wire chemical vapor deposition (HW-CVD) technique;Jadkar;Thin Solid Films,2001
4. Summary of research in NEDO Cat-CVD project in Japan;Matsumura;Thin Solid Films,2001
5. Status of Cat- CVD (Hot Wire CVD) research in United States;Mahan;Thin Solid Films,2001
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