Thin films of GeC deposited using a unique hollow cathode sputtering technique-Reference-Cited by-同舟云学术

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Thin films of GeC deposited using a unique hollow cathode sputtering technique

Published:2006-09 Issue:15 Volume:90 Page:2338-2345
ISSN:0927-0248
Container-title:Solar Energy Materials and Solar Cells
language:en
Short-container-title:Solar Energy Materials and Solar Cells

Author:

Schrader J.S.,Huguenin-Love J.L.,Soukup R.J.,Ianno N.J.,Exstrom C.L.,Darveau S.A.,Udey R.N.,Dalal V.L.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. Growth and properties of microcrystalline germanium–carbide alloys grown using electron cyclotron resonance plasma processing

2. J.T. Herrold, V.L. Dalal, Proc. MRS 664 (2001), paper 25.12.

3. Growth and characterization of epitaxial Ge1−xCx thin films on (100)Si

4. Deposition of electronic quality amorphous silicon,a-Si:H, thin films by a hollow cathode plasma-jet reactive sputtering system

5. Deposition of high quality amorphous silicon, germanium and silicon-germanium thin films by a hollow cathode reactive sputtering system

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characteristics of films deposited by the irradiation of GeCHx+ ions produced from hexamethyldigermane and their dependence on the injected ion energy;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2019-12

2. Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond;AIP Advances;2019-02

3. Antireflection properties of germanium–carbon coating on zinc supplied substrate;Optical and Quantum Electronics;2017-09-11

4. Evaluation of chemical and structural properties of germanium-carbon coatings deposited by plasma enhanced chemical vapor deposition;Journal of Alloys and Compounds;2015-10

5. The use of hollow cathodes in deposition processes: A critical review;Thin Solid Films;2015-03

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