Plasma treatment for chemical SiOx enables excellent passivation of p-type polysilicon passivating contact featuring the lowest J of ∼6 fA/cm2
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference48 articles.
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1. Understanding and mitigating resistive losses in fired passivating contacts: role of the interfaces and optimization of the thermal budget;Solar Energy Materials and Solar Cells;2023-12
2. Effects of LPCVD-deposited thin intrinsic silicon films on the performance of boron-doped polycrystalline silicon passivating contacts;Solar Energy;2023-11
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