Structure, electronic properties and electron energy loss spectra of transition metal nitride films-Reference-Cited by-同舟云学术

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Structure, electronic properties and electron energy loss spectra of transition metal nitride films

Published:2013-01 Issue: Volume:528 Page:49-52
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Koutsokeras L.E.,Matenoglou G.M.,Patsalas P.

Funder

National Strategic Reference Framework

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference39 articles.

1. Ultrathin Diffusion Barriers/Liners for Gigascale Copper Metallization

2. The electrical property of plasma-treated Ta/TaNx diffusion barrier

3. Effectiveness of reactive sputter-deposited Ta–N films as diffusion barriers for Ag metallization

4. Organometallic vapor phase epitaxial growth of GaN on ZrN∕AlN∕Si substrates

5. Plasma energy and work function of conducting transition metal nitrides for electronic applications

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1. Chemical Interaction of Hydrogen Radicals (H*) with Transition Metal Nitrides;The Journal of Physical Chemistry C;2023-09-06

2. Nitrides as Alternative Materials for Plasmonics;Springer Proceedings in Materials;2021-12-02

3. Self-Assembled Dichroic Plasmonic Nitride Nanostructures with Broken Centrosymmetry for Second-Harmonic Generation;ACS Applied Nano Materials;2021-09-15

4. Plasmonic characteristics of niobium nitride thin films modulated by assisting ions;Surfaces and Interfaces;2021-06

5. Defect-mediated ab initio thermodynamics of metastable γ-MoN(001);The Journal of Chemical Physics;2021-02-14

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