Multi-scale simulation of plasma generation and film deposition in a circular type DC magnetron sputtering system-Reference-Cited by-同舟云学术

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Multi-scale simulation of plasma generation and film deposition in a circular type DC magnetron sputtering system

Published:2005-03 Issue:1-2 Volume:475 Page:17-23
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kwon U.H.,Choi S.H.,Park Y.H.,Lee W.J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. Axial distribution of optical emission in a planar magnetron discharge

2. Radial current distribution at a planar magnetron cathode

3. Particle-in-cell charged-particle simulations, plus Monte Carlo collisions with neutral atoms, PIC-MCC

4. Analysis of Three-Dimensional DC Magnetron Discharge by the Particle-in-Cell/Monte Carlo Method

5. Velocity distributions in magnetron sputter

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1. Study on Film Thickness Uniformity of Titanium Fabricated by Magnetron Sputtering;2024

2. Particle-in-Cell Simulations for the Improvement of the Target Erosion Uniformity by the Permanent Magnet Configuration of DC Magnetron Sputtering Systems;Coatings;2023-04-07

3. The Effect Magnet Design on Controlling the Target Erosion Profile for DC Magnetron with the Rectangular Target;Plasma Chemistry and Plasma Processing;2022-10-22

4. 3-Aminobenzeneboronic acid self-assembled monolayer-modified ITO for efficient and stable OLED devices;Journal of Alloys and Compounds;2022-08

5. High-precision modeling of dynamic etching in high-power magnetron sputtering;Journal of Physics D: Applied Physics;2022-05-31

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