Challenges in the industrial deposition of transparent conductive oxide materials by reactive magnetron sputtering from rotatable targets
Author:
Funder
European Union
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference24 articles.
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2. Thirty years of rotatable magnetrons;De Gryse;Thin Solid Films,2012
3. Magnetron sputter deposition: Linking discharge voltage with target properties;Depla;Thin Solid Films,2009
4. Fundamental understanding and modeling of reactive sputtering processes;Berg;Thin Solid Films,2005
5. Low ohm large area ITO coating by reactive magnetron sputtering in DC and MF mode;Strümpfel;Vacuum,2000
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