Low ohm large area ITO coating by reactive magnetron sputtering in DC and MF mode-Reference-Cited by-同舟云学术

Low ohm large area ITO coating by reactive magnetron sputtering in DC and MF mode

Published:2000-11 Issue:2-3 Volume:59 Page:500-505
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Strümpfel J,May C

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference10 articles.

1. Reactive d.c. high-rate sputtering as production technology

2. Saif M, Patel H, Memarian H. In: Proceedings of the Tenth International Conference on Vacuum Web Coating, Fort Lauderdale, Bakish R, editor. November 10–12, 1996, p. 285.

3. Dependence of oxygen flow on optical and electrical properties of DC-magnetron sputtered ITO films

4. ITO coating by reactive magnetron sputtering–comparison of properties from DC and MF processing

5. Strümpfel J. Prozeßstabilisierung beim reaktiven Hochratezerstäuben mittels optischer Emissionsspektroskopie zur industriellen Herstellung von Indium-Zinn-Oxidschichten und Titandioxidsschichten. Thesis. TU Chemnitz, 1991.

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