Performance and quality analysis of Mo–Si multilayers formed by ion-beam and magnetron sputtering for extreme ultraviolet lithography-Reference-Cited by-同舟云学术

Performance and quality analysis of Mo–Si multilayers formed by ion-beam and magnetron sputtering for extreme ultraviolet lithography

Published:2008-02 Issue:8 Volume:516 Page:2050-2057
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Hiruma Kenji,Miyagaki Shinji,Yamanashi Hiromasa,Tanaka Yuusuke,Nishiyama Iwao

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. International Technology Roadmap for Semiconductors, Lithography, 2005 Edition, Semiconductor Industry Association, Texas, 2005, p.24. [http://www.itrs.net/].

2. Molybdenum-silicon multilayer mirrors for the extreme ultraviolet

3. Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and rf magnetron sputtering

4. Characterization of optics and masks for the EUV lithography

5. High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition

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