Influence of shield roughness on Mo/Si defect density for extreme ultraviolet lithography mask blanks
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Published:2013-07
Issue:4
Volume:31
Page:041603
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ISSN:2166-2746
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Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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language:en
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Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Author:
Kageyama Junichi,Yoshimoto Mamoru,Matsuda Akifumi,Jindal Vibhu,Kearney Patrick,Goodwin Frank
Publisher
American Vacuum Society
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials