High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition-Reference-Cited by-同舟云学术

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High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition

Published:2003-07-01 Issue:19 Volume:42 Page:4049
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Spiller Eberhard,Baker Sherry L.,Mirkarimi Paul B.,Sperry Victor,Gullikson Eric M.,Stearns Daniel G.

Publisher

The Optical Society

Reference21 articles.

1. Ion bombardment of X-ray multilayer coatings: Comparison of ion etching and ion assisted deposition

2. Enhancement of the reflectivity of multilayer x-ray mirrors by ion polishing

3. Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings

4. Molybdenum-silicon multilayer mirrors for the extreme ultraviolet

5. Improved reflectance and stability of Mo-Si multilayers

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