Epitaxial growth of cubic silicon carbide on silicon using hot filament chemical vapor deposition

Author:

Hens Philip,Brow Ryan,Robinson Hannah,Cromar Michael,Van Zeghbroeck Bart

Funder

University of Colorado Boulder

University of Colorado at Colorado Springs

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Silicon carbide as a new MEMS technology;Sarro;Sensors Actuators,2000

2. Stress reduction in epitaxial GaN films on Si using cubic SiC as intermediate layers;Komiyama;J. Appl. Phys.,2006

3. Jianwei Wan, M. A. Capano, M. R. Melloch, and James A. Cooper, Jr., “Inversion channel MOSFETs in 3C-SiC on silicon,” Proceedings IEEE Lester Eastman Conference on High Performance Devices at University of Delaware, Newark, Delaware, August 6, 7, and 8 (2002), ISBN: 0-7803-7478-9, 83-89

4. A. Severino, “3C-SiC epitaxial growth on large area silicon: thin films,” Silicon Carbide Epitaxy, 2012: 145-191 ISBN: 978-81-308-0500-9 Chapter 7, Editor: Francesco La Via.

5. Hot-wire chemical vapor deposition and characterization pf p-type nanocrystalline SiC films and their use in Si heterojunction solar cells;Mao;Thin Solid Films,2012

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