Formulation of error propagation and estimation in grating reconstruction by a dual-rotating compensator Mueller matrix polarimeter-Reference-Cited by-同舟云学术

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Formulation of error propagation and estimation in grating reconstruction by a dual-rotating compensator Mueller matrix polarimeter

Published:2014-11 Issue: Volume:571 Page:653-659
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Chen Xiuguo,Liu Shiyuan,Gu Honggang,Zhang Chuanwei

Funder

National Natural Science Foundation of China

National Instrument Development Specific Project of China

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference35 articles.

1. Normal-incidence spectroscopic ellipsometry for critical dimension monitoring

2. Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry

3. Real time scatterometry for profile control during resist trimming process

4. Error analysis in inverse scatterometry I Modeling

5. Developing an uncertainty analysis for optical scatterometry

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1. Condition-number-based measurement configuration optimization for nanostructure reconstruction by optical scatterometry;Measurement Science and Technology;2023-08-10

2. Advanced Mueller matrix ellipsometry: Instrumentation and emerging applications;Science China Technological Sciences;2022-08-15

3. Superachromatic polarization modulator for stable and complete polarization measurement over an ultra-wide spectral range;Optics Express;2022-04-20

4. Design of a Free-form Mueller Matrix Ellipsometer with Imperfect Compensators;KOREAN J OPT PHOTONI;2022

5. Random error analysis of normalized Fourier coefficient in dual-rotating compensator Mueller matrix ellipsometer;Measurement Science and Technology;2021-08-27

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