Nanostructured thin films for multiband-gap silicon triple junction solar cells-Reference-Cited by-同舟云学术

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Nanostructured thin films for multiband-gap silicon triple junction solar cells

Published:2008-08 Issue:20 Volume:516 Page:6818-6823
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Schropp R.E.I.,Li H.,Franken R.H.,Rath J.K.,van der Werf C.H.M.,Schüttauf J.W.A.,Stolk R.L.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference31 articles.

1. High-rate deposition of amorphous hydrogenated silicon: effect of plasma excitation frequency

2. VHF Plasma Deposition: A Comparative Overview

3. Powder dynamics in very high frequency silane plasmas

4. Intrinsic microcrystalline silicon: A new material for photovoltaics

5. Current status of the thermo-catalytic (hot-wire) CVD of thin silicon films for photovoltaic applications

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1. The Infiltration of Silver Nanoparticles into Porous Silicon for Improving the Performance of Photonic Devices;Nanomaterials;2022-01-15

2. Properties of Inorganic Films Prepared by Cat-CVD;Catalytic Chemical Vapor Deposition;2019-02-15

3. Application of Cat-CVD Technologies;Catalytic Chemical Vapor Deposition;2019-02-15

4. Microstructural and Optoelectronic Properties of SiGe:H Films at the Transition Edge Fabricated by PECVD;Crystal Research and Technology;2018-07-19

5. Raman and IR Study on Silicon Films at Transition Regime;SPECTROSC SPECT ANAL;2018

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