Characterization and properties of NiO films produced by rf magnetron sputtering with oxygen ion source assistance-Reference-Cited by-同舟云学术

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Characterization and properties of NiO films produced by rf magnetron sputtering with oxygen ion source assistance

Published:2014-12 Issue: Volume:572 Page:51-55
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Chen S.C.,Wen C.K.,Kuo T.Y.,Peng W.C.,Lin H.C.

Funder

National Science Council and Ministry of Economic Affairs of Taiwan

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. Characterization of sputtered NiO thin films;Chen;Surf. Coat. Technol.,2005

2. Preparation and properties of p-type transparent conductive Cu-doped NiO films;Chen;Thin Solid Films,2011

3. Preferred orientations of NiO films prepared by plasma-enhanced metalorganic chemical vapor deposition;Fujii;Jpn. J. Appl. Phys.,1996

4. Nickel oxide thin films synthesized by reactive pulsed laser deposition: characterization and application to hydrogen sensing;Fasaki;Appl. Phys. A,2008

5. Growth mechanism and magnetic properties of highly crystalline NiO nanocubes and nanorods fabricated by evaporation;Chen;Cryst. Growth Des.,2012

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2. Non-damaging growth and band alignment of p-type NiO/β-Ga₂O₃ heterojunction diodes for high power applications;Journal of Materials Chemistry C;2024

3. Impact of Zinc Concentration on the Structural, Optical, and Photoelectrochemical Properties of Nickel Oxide Thin Films Synthesized by Electrodeposition Method;2024

4. The influence of substrate temperature on the structure and optical properties of NiO thin films deposited using the magnetron sputtering in the layer-by-layer growth regime;Semiconductor Physics, Quantum Electronics and Optoelectronics;2023-12-05

5. Impact of O2/Ar gas ratio on the DC reactive magnetron sputtered NiO thin films for ultrafast detection with high sensitivity and selectivity towards H2S gas;Micro and Nanostructures;2023-12

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