Reactive sputtering of titanium in Ar/CH4 gas mixture: Target poisoning and film characteristics-Reference-Cited by-同舟云学术

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Reactive sputtering of titanium in Ar/CH4 gas mixture: Target poisoning and film characteristics

Published:2009-08 Issue:19 Volume:517 Page:5689-5694
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Fouad O.A.,Rumaiz Abdul K,Shah S. Ismat

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Recent aspects concerning DC reactive magnetron sputtering of thin films: a review

2. Magnetron sputtering: a review of recent developments and applications

3. Control of reactive sputtering processes

4. Target poisoning during reactive sputtering of silicon with oxygen and nitrogen

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