Atomic layer deposition of lanthanum oxide with heteroleptic cyclopentadienyl-amidinate lanthanum precursor - Effect of the oxygen source on the film growth and properties-Reference-Cited by-同舟云学术

Atomic layer deposition of lanthanum oxide with heteroleptic cyclopentadienyl-amidinate lanthanum precursor - Effect of the oxygen source on the film growth and properties

Published:2018-08 Issue: Volume:660 Page:199-206
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Seppälä Sanni^ORCID,Niinistö Jaakko,Mattinen Miika,Mizohata Kenichiro,Räisänen Jyrki,Noh Wontae,Ritala Mikko,Leskelä Markku

Funder

Finnish Centre of Excellence in Atomic Layer Deposition

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference35 articles.

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