Author:
Lamagna L.,Wiemer C.,Perego M.,Volkos S. N.,Baldovino S.,Tsoutsou D.,Schamm-Chardon S.,Coulon P. E.,Fanciulli M.
Subject
General Physics and Astronomy
Reference61 articles.
1. Gate Oxides Beyond SiO2
2. Metal Electrode/High-$k$ Dielectric Gate-Stack Technology for Power Management
3. The High-k Solution
4. Rare Earth Oxide Thin Films: Growth, Characterization, and Applications, Topics in Applied Physics, edited by M. Fanciulli and G. Scarel (Springer, Berlin, 2007), Vol. 106, pp. 1–14.
5. Maximizing performance for higher K gate dielectrics
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