Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition

Author:

Lo Nigro Raffaella,Schilirò Emanuela,Greco Giuseppe,Fiorenza Patrick,Roccaforte Fabrizio

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference32 articles.

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4. CMOS design near the limit of scaling;Taur;IBM J. Res. Dev.,2002

5. GaN-based RF power devices and amplifiers;Mishra;Proc. IEEE,2008

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