Influence of contaminations on the performance of thin-film silicon solar cells prepared after in situ reactor plasma cleaning-Reference-Cited by-同舟云学术

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Influence of contaminations on the performance of thin-film silicon solar cells prepared after in situ reactor plasma cleaning

Published:2008-05 Issue:14 Volume:516 Page:4639-4644
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Hrunski D.,Rech B.,Schmitz R.,Mück A.,Pinçon O.,Breuer U.,Beyer W.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Proceedings of the 5th European Photovoltaic Solar Energy Conference, Athens, Greece, Oct. 17–21;Kusche,1983

2. Plasma diagnostics of a SF6radiofrequency discharge used for the etching of silicon

3. Effects of wall contamination on consecutive plasma processes

4. Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion, Osaka, Japan, May 11–18;Beyer,2003

5. Surface chemical changes of aluminum during NF3-based plasma processing used forin situchamber cleaning

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1. A statistics modeling approach for the optimization of thin film photovoltaic devices;Solar Energy;2017-03

2. Damp heat stable doped zinc oxide films;Thin Solid Films;2014-03

3. a-Si:H/μc-Si:H solar cells prepared by the single-chamber processes—minimization of phosphorus and boron cross contamination;Thin Solid Films;2013-07

4. Improvement of a-Si:H solar cell performance by SiH4 purging treatment;Vacuum;2013-03

5. Cross-contamination in single-chamber processes for thin-film silicon solar cells;Journal of Non-Crystalline Solids;2012-09

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