Surface chemical changes of aluminum during NF3-based plasma processing used forin situchamber cleaning-Reference-Cited by-同舟云学术

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Surface chemical changes of aluminum during NF3-based plasma processing used forin situchamber cleaning

Published:2004-01 Issue:1 Volume:22 Page:158-164
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Li Xi,Hua Xuefeng,Ling Li,Oehrlein Gottlieb S.,Karwacki E.,Ji Bing

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1633566

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3. Surface analysis of yttrium oxyfluoride deposited via air plasma spraying for Erosion resistance against NF3 plasma;Journal of the Korean Ceramic Society;2023-10-06

4. A study of the NF3 plasma etching reaction with cobalt oxide films grown on an inorganic compounds;Nuclear Engineering and Technology;2022-12

5. In-situ process monitoring for eco-friendly chemical vapor deposition chamber cleaning;Journal of the Korean Physical Society;2021-10-25

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