Electrical resistivity of Ti–Zn mixed oxide thin films deposited by atomic layer deposition-Reference-Cited by-同舟云学术

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Electrical resistivity of Ti–Zn mixed oxide thin films deposited by atomic layer deposition

Published:2012-06 Issue:16 Volume:520 Page:5151-5154
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Hazra S.K.,Borgese L.,Federici S.,Bontempi E.,Ferrari M.,Ferrari V.,Plaisier J.R.,Santarelli X.,Zerauschek G.,Lausi A.,Depero L.E.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference34 articles.

1. Atomic Layer Deposition: An Overview

2. Fabrication of zinc titanate nanofibers by electrospinning technique

3. Low temperature nanostructured zinc titanate by an aqueous particulate sol–gel route: Optimisation of heat treatment condition based on Zn:Ti molar ratio

4. Preparation and characterization of TiO2, ZnO, and TiO2/ZnO nanofilms via sol–gel process

5. Electrodeposition of Zn–TiO2 nanocomposite films—effect of bath composition

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic Layer Deposition of Chlorine Containing Titanium–Zinc Oxide Nanofilms Using the Supercycle Approach;Coatings;2023-05-20

2. Atomic layer deposition of semiconductor oxides on electric sail tethers;Thin Solid Films;2017-01

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