Catalyst enhancement approach for improving the removal rate and stability of silica glass polishing via catalyzed chemical etching in pure water
Author:
Funder
Adaptable and Seamless Technology Transfer Program through Target-Driven R and D
Japan Society for the Promotion of Science
Japan Science and Technology Agency
University of Tokyo
Publisher
Elsevier BV
Subject
General Engineering
Reference32 articles.
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3. Achieving ultralow surface roughness and high material removal rate in fused silica via a novel acid SiO2 slurry and its chemical-mechanical polishing mechanism;Shi;Appl Surf Sci,2022
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