Experimental and numerical investigations into the transient multi-wafer batch atomic layer deposition process with vertical and horizontal wafer arrangements-Reference-Cited by-同舟云学术

Experimental and numerical investigations into the transient multi-wafer batch atomic layer deposition process with vertical and horizontal wafer arrangements

Published:2015-12 Issue: Volume:91 Page:416-427
ISSN:0017-9310
Container-title:International Journal of Heat and Mass Transfer
language:en
Short-container-title:International Journal of Heat and Mass Transfer

Author:

Pan Dongqing,Ma Lulu,Xie Yuanyuan,Wang Fenfen,Jen Tien-Chien,Yuan Chris

Funder

National Science Foundation

Publisher

Elsevier BV

Subject

Fluid Flow and Transfer Processes,Mechanical Engineering,Condensed Matter Physics

Reference33 articles.

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5. Batch ALD: characteristics, comparison with single wafer ALD, and examples;Granneman;Surf. Coat. Technol.,2007

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