Atomistic simulations of morphology and spreading behavior of cluster beam deposition-Reference-Cited by-同舟云学术

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Atomistic simulations of morphology and spreading behavior of cluster beam deposition

Published:2010-10 Issue:4 Volume:49 Page:850-857
ISSN:0927-0256
Container-title:Computational Materials Science
language:en
Short-container-title:Computational Materials Science

Author:

Hong Zheng-Han,Fang Te-Hua,Lin Shiang-Jiun,Hwang Shun-Fa

Publisher

Elsevier BV

Subject

Computational Mathematics,General Physics and Astronomy,Mechanics of Materials,General Materials Science,General Chemistry,General Computer Science

Reference30 articles.

1. Void formation during film growth: A molecular dynamics simulation study

2. A two‐dimensional molecular dynamics simulation of thin film growth by oblique deposition

3. Surface alloy formation of Co on Al surface: Molecular dynamics simulation

4. Surface characteristics of epitaxially grown Ni layers on Al surfaces: Molecular dynamics simulation

5. Molecular dynamics and experimental studies on deposition mechanisms of ion beam sputtering

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2. Growth and defect formation mechanism of CVD-prepared SiC coatings based on cross-scale simulation;Chemical Engineering Journal;2024-01

3. Growth Mechanism of a Batch Deposited Sic Coating on Large-Size Graphite Plates Based on Multi-Scale Simulation;2024

4. Palladium clusters deposited on the heterogeneous substrates;Applied Surface Science;2016-07

5. Molecular Dynamics Simulation of Pd Clusters Deposited on Pd/Ag Substrates;Acta Physico-Chimica Sinica;2015

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