Atomistic mechanisms of chemical mechanical polishing of diamond (1 0 0) in aqueous H2O2/pure H2O: Molecular dynamics simulations using reactive force field (ReaxFF)-Reference-Cited by-同舟云学术

Atomistic mechanisms of chemical mechanical polishing of diamond (1 0 0) in aqueous H2O2/pure H2O: Molecular dynamics simulations using reactive force field (ReaxFF)

Published:2019-02 Issue: Volume:157 Page:99-106
ISSN:0927-0256
Container-title:Computational Materials Science
language:en
Short-container-title:Computational Materials Science

Author:

Guo Xiaoguang,Yuan Song,Wang Xiaoli,Jin Zhuji,Kang Renke

Funder

Science Fund for Creative Research Groups

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Computational Mathematics,General Physics and Astronomy,Mechanics of Materials,General Materials Science,General Chemistry,General Computer Science

Reference49 articles.

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4. Chemical mechanical planarization: slurry chemistry, materials, and mechanisms;Krishnan;Chem. Rev.,2010

5. Chemical mechanical polishing of thin film diamond;Thomas;Carbon,2014

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