Predictive process design: a theoretical model of atomic layer deposition
Author:
Publisher
Elsevier BV
Subject
Computational Mathematics,General Physics and Astronomy,Mechanics of Materials,General Materials Science,General Chemistry,General Computer Science
Reference20 articles.
1. Atomic layer deposition (ALD): from precursors to thin film structures
2. Atomic Layer Deposition of AlO[sub x] for Thin Film Head Gap Applications
3. High-resolution depth profiling in ultrathin Al2O3 films on Si
4. Theory of the clean and hydrogenatedAl2O3(0001)−(1×1)surfaces
5. Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry
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