Parametric Studies of Pulsed Nd:YAG Laser Deposition of ITO for OLED Application
Author:
Affiliation:
1. Faculty of Engineering, Multimedia University, Cyberjaya 63100, Selangor, Malaysia
Publisher
Laser Society of Japan
Link
http://www.jstage.jst.go.jp/article/lsj/36/APLS/36_APLS_1242/_pdf
Reference27 articles.
1. 1) H. L. Hartnagel, A. L. Dawar, A. K. Jain, C. Jagadish: Semiconducting Transparent Thin Films (Institute of Physics Publishing, Bristol and Philadelphia, 1995).
2. Properties of indium tin oxide (ITO) films prepared by r.f. reactive magnetron sputtering at different pressures
3. Effects of oxygen partial pressure on the microstructure and electrical properties of indium tin oxide film prepared by d.c. magnetron sputtering
4. Comparison of spray pyrolyzed FTO, ATO and ITO coatings for flat and bent glass substrates
5. Low resistivity indium tin oxide films by pulsed laser deposition
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