Effects of oxygen partial pressure on the microstructure and electrical properties of indium tin oxide film prepared by d.c. magnetron sputtering-Reference-Cited by-同舟云学术

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Effects of oxygen partial pressure on the microstructure and electrical properties of indium tin oxide film prepared by d.c. magnetron sputtering

Published:1995-03 Issue:1-2 Volume:258 Page:274-278
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Choi Chaun Gi,No Kwangsoo,Lee Won-Jae,Kim Ho-Gi,Jung Soo Ok,Lee Won Jong,Kim Wook Sung,Kim Se Jong,Yoon Cheon

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Preparation and characterization of rf sputtered indium tin oxide films

2. X‐ray photoemission spectroscopy studies of Sn‐doped indium‐oxide films

3. Evaporated Sn‐doped In2O3films: Basic optical properties and applications to energy‐efficient windows

4. Post-deposition annealing effects in RF reactive magnetron sputtered indium tin oxide thin films

5. Highly conductive and transparent films of tin and fluorine doped indium oxide produced by APCVD

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1. Multilayer heterogeneous electrical insulation structure of HfO2/Al2O3 for high-temperature thin-film sensor on superalloy substrate;Applied Surface Science;2024-01

2. Influence of oxygen on the optical and electrical properties of magnetron-sputtered indium tin oxide thin films at ambient temperature;Thin Solid Films;2024-01

3. Influence of the Oxygen during the Deposition of an Indium Tin Oxide Thin Film by Magnetron Sputtering for Heterojunction Solar Cells;Semiconductors;2023-09

4. Field assessment of Transparent Conductive Oxides Stability Under Outdoor Conditions;2022 IEEE 49th Photovoltaics Specialists Conference (PVSC);2022-06-05

5. Transparent and conductive IZO films: Oxygen and discharge voltage controlled sputtering growth and properties;Vacuum;2022-01

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