Review of applications of Defect Photoluminescence Imaging (DPLI) during IC processing-Reference-Cited by-同舟云学术

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Review of applications of Defect Photoluminescence Imaging (DPLI) during IC processing

Published:2019-06 Issue: Volume: Page:
ISSN:
Container-title:2019 19th International Workshop on Junction Technology (IWJT)
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Author:

Jastrzebski L.,Roffarello ,Nadudvari G.,Kiss Z.,Lajtos I.,Pongracz A.,Molnar G.,Nagy M.,Dudas L.,Basa P.,Greenwood B.,Duru R.,Gambino J.,Le-Cunff D.,Cannac M.,Joblot S.,Mica I.,Polignano M. L.,Galbiati A.,Monge P.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/8787338/8802613/08802893.pdf?arnumber=8802893

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Lateral mapping of damage patterns in plasma immersion ion-implanted silicon;MRS Advances;2022-11-28

2. Automatic Defect Detection in Epitaxial Layers by Micro Photoluminescence Imaging;IEEE Transactions on Semiconductor Manufacturing;2022-08

3. Photoluminescence imaging for slip line detection and characterization in silicon substrates;2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2022-05-02

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