Lateral mapping of damage patterns in plasma immersion ion-implanted silicon-Reference-Cited by-同舟云学术

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Lateral mapping of damage patterns in plasma immersion ion-implanted silicon

Published:2022-11-28 Issue:36 Volume:7 Page:1321-1325
ISSN:2059-8521
Container-title:MRS Advances
language:en
Short-container-title:MRS Advances

Author:

Kéri O.,Kerekes Á.,Szívós J.,Sütő A.,Korsós F.,Nádudvari G.,Zolnai Z.^ORCID

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://link.springer.com/content/pdf/10.1557/s43580-022-00381-5.pdf

Reference6 articles.

1. L. Jastrzebski et al., 19th IWJT, 1–6 (2019). https://doi.org/10.23919/IWJT.2019.8802893

2. www.srim.org®

3. M. Posselt, Crystal-TRIM (04/1D), User Manual, 1–12

4. Z. Zolnai et al., 32nd Annual SEMI ASMC, 1–6 (2021). https://doi.org/10.1109/ASMC51741.2021.9435658

5. J. Szívós et al., IEEE J. Electron Devices Soc. 10, 761–768 (2022)

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