Self-Allancd Gate Contact (SAGC) for CMOS technology scaling beyond 7nm-Reference-Cited by-同舟云学术

Self-Allancd Gate Contact (SAGC) for CMOS technology scaling beyond 7nm

Published:2019-06 Issue: Volume: Page:
ISSN:
Container-title:2019 Symposium on VLSI Technology
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Author:

Xie Ruilong,Park Chanro,Conti Richard,Robison Robert,Zhou Huimei,Saraf Iqbal,Carr Adra,Fan Susan Su Chen,Ryan Kevin,Belyansky Michael,Pancharatnam Shanti,Young Albert,Wang Junli,Greene Andrew,Cheng Kangguo,Li Juntao,Conte Richard,Tang Hao,Choi Kisik,Amanapu Hari,Peethala Brown,Muthinti Raja,Raymond Mark,Prindle Christopher,Liang Yong,Tsai Stan,Kamineni Vimal,Labonte Andre,Cave Nigel,Gupta Dinesh,Basker Veeraraghavan,Loubet Nicolas,Guo Dechao,Haran Bala,Knorr Andreas,Bu Huiming

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/8766306/8776475/08776492.pdf?arnumber=8776492

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