Micro-Positioning End-Stage for Precise Multi-Axis Motion Control in Optical Lithography Machines: Preliminary Results
Author:
Funder
Natural Sciences and Engineering Research Council of Canada
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9482409/9482614/09483343.pdf?arnumber=9483343
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. High-precise Motion Control Hardware System and Key Timing Management Research;Journal of Physics: Conference Series;2023-12-01
2. Lithographic Stepping Trajectory Planning for Residual Vibration Suppression: An Asymmetric S-Curve Method;2023 International Workshop on Advanced Patterning Solutions (IWAPS);2023-10-26
3. Koopman Operator Learning Control of the Piezoelectric Actuator;2023 42nd Chinese Control Conference (CCC);2023-07-24
4. Kinodynamic Generation of Wafer Scanners Trajectories Used in Semiconductor Manufacturing;IEEE Transactions on Automation Science and Engineering;2023-01
5. Research on the Pressure Regulator Effect on a Pneumatic Vibration Isolation System;Chinese Journal of Mechanical Engineering;2022-10-22
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